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Standard Guide for Specimen Preparation and Mounting in Surface Analysis
Automatische name übersetzung:
Standard-Leitfaden für die Probenvorbereitung und Montage in Oberflächenanalyse
NORM herausgegeben am 10.8.2002
Bezeichnung normen: ASTM E1078-02
Anmerkung: UNGÜLTIG
Ausgabedatum normen: 10.8.2002
SKU: NS-40355
Zahl der Seiten: 9
Gewicht ca.: 27 g (0.06 Pfund)
Land: Amerikanische technische Norm
Kategorie: Technische Normen ASTM
Keywords:
auger electron spectroscopy, secondary ion mass spectroscopy, specimen mounting, specimen preparation, specimen treatment, surface analysis, x-ray photoelectron spectroscopy
Significance and Use | ||||||||||||
Proper preparation and mounting of specimens is particularly critical for surface analysis. Improper preparation of specimens can result in alteration of the surface composition and unreliable data. Specimens should be handled carefully so as to avoid the introduction of spurious contaminants in the preparation and mounting process. The goal must be to preserve the state of the surface so that the analysis remains representative of the original. Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS or ESCA), and secondary ion mass spectrometry (SIMS) are sensitive to surface layers that are typically a few nanometers (nm) thick. Such thin layers can be subject to severe perturbations caused by specimen handling (1)3 or surface treatments that may be necessary prior to introduction into the analytical chamber. In addition, specimen mounting techniques have the potential to affect the intended analysis. This guide describes methods that the surface analyst may need to minimize the effects of specimen preparation when using any surface-sensitive analytical technique. Also described are methods to mount specimens so as to ensure that the desired information is not compromised. Guide E 1829 describes the handling of surface sensitive specimens and, as such, complements this guide. |
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1. Scope | ||||||||||||
1.1 This guide covers specimen preparation and mounting prior to, during, and following surface analysis and applies to the following surface analysis disciplines: 1.1.1 Auger electron spectroscopy (AES), 1.1.2 X-ray photoelectron spectroscopy (XPS and ESCA), and 1.1.3 Secondary ion mass spectrometry, (SIMS). 1.1.4 Although primarily written for AES, XPS, and SIMS, these methods will also apply to many surface sensitive analysis methods, such as ion scattering spectrometry, low energy electron diffraction, and electron energy loss spectroscopy, where specimen handling can influence surface sensitive measurements. 1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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2. Referenced Documents | ||||||||||||
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