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Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
Automatische name übersetzung:
Standard-Leitfaden zur Messung von Breiten von Schnittstellen in der Tiefenprofilierung Mit SIMS
NORM herausgegeben am 1.11.2011
Bezeichnung normen: ASTM E1438-11
Anmerkung: UNGÜLTIG
Ausgabedatum normen: 1.11.2011
SKU: NS-41752
Zahl der Seiten: 3
Gewicht ca.: 9 g (0.02 Pfund)
Land: Amerikanische technische Norm
Kategorie: Technische Normen ASTM
Keywords:
ICS Number Code 29.045 (Semiconducting materials)
Significance and Use | ||
Although it would be desirable to measure the extent of profile distortion in any unknown sample by using a standard sample and this guide, measurements of interface width (profile distortion) can be unique to every sample composition (1, 2, 3).3 This guide, that describes a method that determines the unique width of a particular interface for the chosen set of operating conditions. It is primarily intended to provide a method for checking on proper or consistent, or both, instrument performance. Periodic analysis of the same sample followed by a measurement of the interface width, in accordance with this guide, will provide these checks. The procedure described in this guide is adaptable to any layered sample with an interface between layers in which a nominated element is present in one layer and absent from the other. It has been shown that for SIMS in particular (4, 5) and for surface analysis in general (6, 7), only rigorous calibration methods can determine accurate interface widths. Such procedures are prohibitively time-consuming. Therefore the interface width measurement obtained using the procedure described in this guide may contain significant systematic error (8). Therefore, this measure of interface width may have no relation to similar measures made with other methods. However, this does not diminish its use as a check on proper or consistent instrument performance, or both. |
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1. Scope | ||
1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens. 1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution. This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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2. Referenced Documents | ||
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Historisch
1.11.2013
Historisch
1.11.2012
Historisch
1.6.2011
Historisch
1.6.2011
Historisch
1.5.2013
Historisch
15.6.2008
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